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Acquisition of a Scanning Electron Microscope for Electron Beam Lithography
R 5,419
Acquisition of a Scanning Electron Microscope for Electron Beam Lithography

DURIP: Request for Lithography and Metallization Equipment
R 5,419
DURIP: Request for Lithography and Metallization Equipment

Multicolor Lithography for High Efficiency, Low Insertion Loss NLO polymer Devices
R 5,419
Multicolor Lithography for High Efficiency, Low Insertion Loss NLO polymer Devices

Roll-to-Roll, Projection Lithography System for High-Resolution Patterning of Flexible Substrates, Volume 1
R 5,419
Roll-to-Roll, Projection Lithography System for High-Resolution Patterning of Flexible Substrates, Volume 1

High Speed, High Accuracy Stage for Advanced Lithography. Phase I
R 5,419
High Speed, High Accuracy Stage for Advanced Lithography. Phase I

Point Source X-Ray Lithography System for Sub-0.15 Micron Design Rules
R 6,517
Point Source X-Ray Lithography System for Sub-0.15 Micron Design Rules

Self-Assembly Based Approaches to Microelectronic Fabrication and Devices: Surface Passivation, Soft Lithography, Electrically Functional Systems, and Hierarchical Self-Assembly
R 5,419
Self-Assembly Based Approaches to Microelectronic Fabrication and Devices: Surface Passivation, Soft Lithography, Electrically Functional Systems, and Hierarchical Self-Assembly

Scanning Probe Lithography. 4. Effect of Scanning Tunneling Microscope Tip Parameters on Lithographic Patterns in Self-Assembling Monolayers
R 5,419
Scanning Probe Lithography. 4. Effect of Scanning Tunneling Microscope Tip Parameters on Lithographic Patterns in Self-Assembling Monolayers

Low Voltage Electron Beam Lithography
R 5,419
Low Voltage Electron Beam Lithography

Electron Specimen Interaction in Low Voltage Electron Beam Lithography
R 5,419
Electron Specimen Interaction in Low Voltage Electron Beam Lithography

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