Field Guide to Optical Lithography
Product ID: 0819462071
Condition: USED (All books in used condition)
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Product Description
Condition - Very Good
The item shows wear from consistent use but remains in good condition. It may arrive with damaged packaging or be repackaged.
Field Guide to Optical Lithography
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Contents
- Symbol Glossary
- The Lithgraphy Process
- Image Formation
- Imaging into a Photoresist
- Photoresist Chemistry
- Lithography Control and Optimization
- Equation Summary
- Glossary
- Index
Technical Specifications
Country
USA
Manufacturer
SPIE Publications
Binding
Spiral-bound
UnitCount
1
EANs
9780819462077
